Device for cleaning argon and other technical gases "Epishur-A SL" buy with delivery in Russia.

Epishur-A SL is a series of autonomous installations designed for fine purification of not only argon, but also all inert gases, hydrogen, oxygen, nitrogen, and pyrolysis gases. Thanks to its own developments, the company has achieved the ability to significantly improve the characteristics of the plants (in some cases, the impurities total ppb units) without significantly increasing the price.

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Description
Characteristics
Applications
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The Epishur-A SL device is an effective means of producing clean gases and can be used to solve a wide range of research and production tasks that require a clean gas environment or a given gas composition in sealed chambers( boxes), technological installations and premises.

Initially, the production of "Epishur-A SL" was intended to meet the needs of laboratories in pure argon. But gradually, responding to the requests of various enterprises and organizations, the line of manufactured devices expanded.

In addition to scientific and research tasks, clean gases are widely used in industry. In metallurgy, for cooling metal, for accelerating the melting of the introduced components, for degassing Al during casting, for protecting against air during metal spills, for melting Ti, W, Be, Zr and other metals.

For heat treatment, contact, laser, and electric arc welding. For cutting Cr, Ni, Al, Mg and their alloys. In plasma spraying plants, in the production of lasers.

In medicine.

Below in the "Applications" section is a list of the use of "Epishur-A SL" devices by some of our users.

Features:

High reliability. Epishur-A SL units have been operating in the factory for more than ten years without repair and, depending on modifications, without replacing filters.
Low cost of operation. The service life of the filters and the quality of the components have a high degree of reliability. In rare cases of repair-the cost of parts is low.
Filters, as well as the main parts of the installations are produced by GC "Spectral Laboratory", therefore, they are always available and at the lowest price.
From the available range of installation models, the customer can choose the optimal one. You can make an exclusive model according to the technical specification.
The price of any installation is much lower than imported analogues.
The filter regeneration mode is performed without disconnecting the unit from the gas utilities.
Up to seven stages of cleaning. In the process of cleaning inert gases, gas absorbers remove oxygen, nitrogen, hydrogen, carbon monoxide, and hydrocarbons. The molecular filter filters out water vapor, carbon dioxide, and hydrogen sulfide by physical adsorption. The fine filter protects against dust particles larger than 1 micron.
In the basic version, the gas is purified to the level of 0.5 ppm of the total amount of all harmful impurities.
Complete with finish catalytic filters — up to level 1 ppb.
Epishur-A cleans not only argon and other inert gases, but also oxygen, nitrogen, hydrogen, and pyrolysis gases.

Applications:

Purified argon is used for various types of optical spectroscopy, while helium and argon are used for gas chromatography.
For scientific research. Example: an argon purification plant with impurities less than 1 ppt (99.999 999 999 9%) was released.
During welding operations.
In the aircraft industry.
In chemical industries.
In the space industry.
In the nuclear industry.
In the polymer industry.
In the smelting of titanium and the production of titanium parts.
In the production of thermoceramics.
When growing single crystals.
This includes laser growth of crystals from metal powders.
Oxygen and hydrogen with an impurity content of no more than 1 ppm are used for the production of quartz glasses.
In the production of optical fiber.
Hydrogen for the production of catalysts.
Pure nitrogen and helium for high-tech industries.
For the production of pure pyrolysis gases.
For the production of pure hydrogen for industrial purposes.

Initially, the development and production of devices for gas purification was caused by the need to produce argon for spectrometers. The argon content is not less than 99.998%. Responding to the needs of different industries, plants were created to purify not only all inert and pyrolysis gases, but also hydrogen, nitrogen and oxygen with much less impurities (up to ppb).

Main technical characteristics of the Epishur-A SL modifications

Parameters	Epishur-A 100 SL	Epishur-A 12 SL	Epishur-A 04 SL	Epishur-A 32 SL	Epishur-A 21 (212; 204; 232) SL
Capacity, max l / min	10	30	100	500	30-500
Estimated level of gas contamination at the inlet, ppm	≤ 50	70-150	100-300	300-1000	70-1000
Gas pollution level at the outlet (basic version of the device), ppm	< 0,5				< 0.5 by volume fraction of moisture
The level of gas pollution at the outlet (using finish filters), ppt	<100 H₂O, O₂, CO, CO₂, H₂ (for nitrogen and argon purifiers).Filtration from mechanical particles 0.003 microns				-
Filtration from mechanical particles, microns	≥1 (≥0.01 on a separate request)
Time to enter the operating mode, min.	15	15	30	60	7
Power consumption in operating mode, kW	≤1	≤1	≤2	≤3	≤1
Weight, kg	30	40	57	190	Standard cases of Epishur-A SL
Overall dimensions, mm	750x420x 320	730x590x 360	1130x610x390	1800x840x580	Standard cases of Epishur-A SL

Applications:

Purified argon is used for various types of optical spectroscopy, while helium and argon are used for gas chromatography.
For scientific research. Example: an argon purification plant with impurities less than 1 ppt (99.999 999 999 9%) was released.
During welding operations.
In the aircraft industry.
In chemical industries.
In the space industry.
In the nuclear industry.
In the polymer industry.
In the smelting of titanium and the production of titanium parts.
In the production of thermoceramics.
When growing single crystals. This includes laser growing of crystals from metal powders.
Oxygen and hydrogen with an impurity content of no more than 1 ppm are used for the production of quartz glasses.
In the production of optical fiber.
Hydrogen for the production of catalysts.
Pure nitrogen and helium for high-tech industries.
For the production of pure pyrolysis gases.
For the production of pure hydrogen for industrial purposes.

Instructions for use

#	The company that uses the device
1	JSC "ROSATOM", cold processing plant
2	IP Muravyov, factory
3	ISA LLC, metal analysis shop